Formation of High Purity Films by Negative Ion Beam Sputtering Using an Ultra-high Vacuum Self-Sputtering Method
نویسندگان
چکیده
منابع مشابه
Low Resistive Copper Thin Film Deposited with Ultra-high Purity Target and Ecr-ion Beam Sputtering
A thin film process using ECR-ion beam sputtering with ultra pure (99.999999%) copper target was investigated for improving transportation properties in the film. The electric resistivity of the thin film was 40% lower than that of using a commercial-grade purity target. And the optical qualities evaluated by the transmission and reflection spectrum measurements were also indicate slower relaxa...
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ژورنال
عنوان ژورنال: Materials Transactions, JIM
سال: 2000
ISSN: 0916-1821,2432-471X
DOI: 10.2320/matertrans1989.41.31